K&F Concept Nano-X MRC UV Ultra-low Reflection 55mm Filter

The MRC UV Ultra-low Reflection Nano-X is a high-quality K&F Concept ultraviolet filter with a diameter of 55 mm. It is a versatile accessory that provides comprehensive lens protection: it effectively reduces the influx of ultraviolet radiation, improves the quality of the scene and protects the optical system from mechanical damage, dust, dust and moisture.

The K&F Concept filters are made of multi-coated optical glass. The MRC (Multi Resistant Coating) technology effectively reduces glare (≤ 0.1%) for accurate color reproduction. The additional hardening protects against chipping and makes the filter surface scratch-resistant . The lens also does not accumulate greasy stains and stains do not form on it. A special titanium coating guarantees excellent light transmission of up to ≥ 99.8%.

The filter is embedded in a light and thin (3.3 mm) aluminum frame. Double threading allows the simultaneous use of additional accessories such as other filters or sun visors.

Features

• Multi-coating MRC UV filter
• Anti-reflective Nano coatings
• Titanium coating
• Effective reduction of ultraviolet radiation
• Light transmission: ≥ 99.8%
• Optical Glass
• Aluminum frame
• Resistant to damp patches and greasy stains
• Easy to clean
• Double threading
• Thickness: 3.3mm
• Diameter: 55 mm

Use

MRC UV filters are used to protect the lens from the influx of ultraviolet radiation, which can reduce the amount of detail in the images and give them a characteristic blue tint. Ultra-low reflection filters improve image quality while maintaining very high light transmission. They also create an additional protective barrier, thanks to which the lens itself is not exposed to dirt or mechanical damage. UV filters are an indispensable element of every photographer's equipment. Don't forget to take them with you outdoors!