K&F Concept Nano-X MRC UV Ultra-low Reflection 52mm Filter
Description
The K&F Concept Ultra-low Reflection Nano-X multi-coating ultraviolet filter is a practical accessory that provides comprehensive lens protection. It effectively reduces the inflow of UV radiation and protects the optical system against mechanical damage or the adverse effects of external factors. It is designed to be mounted on 52 mm objective lenses equipped with traditional threading.
The filter lens is made of optical glass covered with a multi-layer MRC (Multi Resistant Coating). Protective layers effectively reduce glare (≤ 0.1%), improve the clarity of the scene and faithfully reproduce the natural colors of the environment. The additional curing protects against chipping and makes the surface of the filter resistant to scratches, water stains and greasy stains. In addition, the titanium-coated lens has an excellent light transmission of ≥ 99.8%.
The filter mounting frame is made of aluminum, and double threading allows the use of additional accessories. The bezel is also very thin (3.3 mm), which makes it easy to work with wide-angle lenses.
Features
- Multi-coating MRC UV filter
- Anti-reflective Nano coatings
- Titanium coating
- Effective reduction of ultraviolet radiation
- Light transmission: ≥ 99.8%
- Optical Glass
- Aluminum frame
- Resistant to damp patches and greasy stains
- Easy to clean
- Double threading
- Thickness: 3.3mm
- Diameter: 52 mm
Use
MRC UV filters are used to protect the lens from the influx of ultraviolet radiation, which can cause blurriness, reduced contrast and loss of detail in photos. They also create a physical additional barrier that protects the lens lens from dust, dust and mechanical damage. They are a basic and indispensable element of every photographer's equipment who cares about the quality of the image and the durability of his equipment.
More Information
| Manufacturer | K&F Concept |
|---|---|
| EAN | 5904647821927 |